SURFACE-INDUCED ORDERING IN ASYMMETRIC BLOCK-COPOLYMERS

Citation
Y. Liu et al., SURFACE-INDUCED ORDERING IN ASYMMETRIC BLOCK-COPOLYMERS, Macromolecules, 27(14), 1994, pp. 4000-4010
Citations number
34
Categorie Soggetti
Polymer Sciences
Journal title
ISSN journal
00249297
Volume
27
Issue
14
Year of publication
1994
Pages
4000 - 4010
Database
ISI
SICI code
0024-9297(1994)27:14<4000:SOIAB>2.0.ZU;2-M
Abstract
The surface-induced ordering in thin films of asymmetric deuterated po lystyrene (dPS)-poly(vinylpyridine) (PVP) diblock and triblock copolym ers of comparable polymerization index and PVP volume fraction (f appr oximately 0.25) was studied using transmission electron microscopy, at omic force microscopy, secondary ion mass spectrometry, and neutron re flectivity. The morphology of both di- and triblock copolymer films wa s found to be cylindrical except for the layer adjacent to the silicon oxide surface, which due to the strong interaction of silica with PVP , was lamellar. The spacing between adjacent cylindrical layers was fo und to be consistent with mean field theory predictions. In the triblo ck copolymer films the cylindrical layers were oriented parallel to th e silicon oxide surface, and no decay of the ordered structure was obs erved for at least 12 periods. If the total film thickness t' deviated from t = [(n + 0.71)210 + 182] angstrom, where n is an integer, islan ds or holes formed at the vacuum interface. The height of the holes or islands reached its equilibrium value, 210 angstrom, after annealing 24 h at 180-degrees-C. In contrast, it was far more difficult to orien t parallel to the silicon oxide surface the microphase-separated cylin drical domains in the diblock copolymer films. As a result no islands or holes were observed even after annealing for 5 days at 180-degrees- C. We concluded that the difference in ordering behavior was due to th e ability of the triblock copolymer to form an interconnected micelle network while the diblock copolymer formed domains that were free to m ove with respect to each other. This conclusion was further confirmed by diffusion measurements which showed that the PS homopolymer penetra ted easily into the ordered diblock copolymer films and was excluded f rom the ordered triblock copolymer films.