DEPOSITION AND PIEZOELECTRIC CHARACTERISTICS OF ZNO FILMS BY USING ANECR SPUTTERING SYSTEM

Piezoelectric properties of ZnO films, were investigated by using an E lectron Cyclotron Resonance (ECR) sputtering system. It was confirmed that this system was capable of depositing a ZnO film with a large spe cific resistance, and good c-axis orientation on an interdigital trans ducer (IDT)/glass substrate at a low temperature (less than 200-degree s-C) and in a low gas pressure (approximately 10(-4) torr). Furthermor e these ZnO films exhibited excellent SAW characteristics (insertion l osses) and effective electromechanical coupling factors (k(eff)) compa red with ZnO films deposited by a conventional RF magnetron sputtering system. Further, this ECR sputtering system was capable of depositing a ZnO film, without heating the substrate, that was capable of propag ating a Rayleigh SAW at 700 MHz for the first time.