LAPLACE TRANSFORM DEEP-LEVEL TRANSIENT SPECTROSCOPIC STUDIES OF DEFECTS IN SEMICONDUCTORS

Citation
L. Dobaczewski et al., LAPLACE TRANSFORM DEEP-LEVEL TRANSIENT SPECTROSCOPIC STUDIES OF DEFECTS IN SEMICONDUCTORS, Journal of applied physics, 76(1), 1994, pp. 194-198
Citations number
22
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
76
Issue
1
Year of publication
1994
Pages
194 - 198
Database
ISI
SICI code
0021-8979(1994)76:1<194:LTDTSS>2.0.ZU;2-C
Abstract
A quantitative improvement in deep-level transient spectroscopy (DLTS) resolution has been demonstrated by using Laplace transform method fo r the emission rate analysis. Numerous tests performed on the software used for the calculations as well as on the experimental setup clearl y demonstrated that in this way the resolution of the method can be in creased by more than an order of magnitude. Considerable confidence in this approach was gained through measurements of a selection of well- characterized point defects in various semiconductors. The results for platinum in silicon and EL2 in GaAs are presented. For each of these cases conventional DLTS give broad featureless lines, while Laplace DL TS reveals a fine structure in the emission process producing the spec tra.