INTERFACIAL CHARACTERIZATION OF ION-BEAM-DEPOSITED AC FILMS ON GE

Citation
T. Bruce et al., INTERFACIAL CHARACTERIZATION OF ION-BEAM-DEPOSITED AC FILMS ON GE, Journal of applied physics, 76(1), 1994, pp. 552-557
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
76
Issue
1
Year of publication
1994
Pages
552 - 557
Database
ISI
SICI code
0021-8979(1994)76:1<552:ICOIAF>2.0.ZU;2-7
Abstract
Diamondlike carbon films were deposited on germanium crystals with a m ass-separated C+ ion beam in ultrahigh vacuum over the energy range 20 -275 eV, and the interfaces were characterized with x-ray photoelectro n spectroscopy. It was found that ion bombardment induced a carbide ph ase on the germanium surface. Further carbon accumulation then led to the growth of an amorphous carbon overlayer. The carbide phase was ide ntified by a rather low C 1s binding energy (at about 283.8 eV) and sm all positive shift of the Ge 3p peak (about 0.4 eV). The valence-band spectra of these samples also suggested that germanium carbide formed with a pure carbon beam for the bombardment energy range considered ha s a band gap between germanium and diamondlike carbon.