ZIRCONIA COATINGS REALIZED BY MICROWAVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

Citation
G. Bertrand et R. Mevrel, ZIRCONIA COATINGS REALIZED BY MICROWAVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Thin solid films, 292(1-2), 1997, pp. 241-246
Citations number
17
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
292
Issue
1-2
Year of publication
1997
Pages
241 - 246
Database
ISI
SICI code
0040-6090(1997)292:1-2<241:ZCRBMP>2.0.ZU;2-G
Abstract
This study presents an evaluation of a new process microwave plasma-en hanced chemical vapor deposition to deposit thermal barrier coatings ( TBCs) consisting of yttria partially stabilized zirconia. A reactor ha s been designed and realized at ONERA with a view to provide an altern ative technique to the processes already in use for depositing TBCs on gas turbine airfoils. It is demonstrated that zirconia coatings havin g a columnar structure can be deposited with a high rate (up to 5 mu m min(-1)) compatible with production requirements. Plasma study by opt ical emission spectroscopy has lead to the identification of reactive species and to the determination of the plasma distribution and locati on with respect with the gas flow and the reactor chamber geometry. A systematic study has been engaged to determine the influence of operat ing parameters on the structure, the morphology of the coatings and th e deposition rate.