Diamond growth at room temperature [i.e., on unheated monocrystalline
silicon (111) substrates], has been demonstrated by the laser irradiat
ion of CO/H-2 gas mixtures at low pressures. The CO is photodissociate
d by a multiphoton process using 193 nm radiation from an excimer lase
r. This process, referred to as laser chemical vapor deposition (LCVD)
, is distinct from the laser-excited CVD (LECVD) process described in
an earlier publication. Although no quantitative measurements have yet
been made on the gas-phase species compositions in LCVD, the growth o
f diamond particles at room temperature marks a beginning to enabling
diamond deposition on materials with low melting temperatures.