Dn. Fan et al., COMPUTER-SIMULATION OF TOPOLOGICAL EVOLUTION IN 2-D GRAIN-GROWTH USING A CONTINUUM DIFFUSE-INTERFACE FIELD MODEL, Acta materialia, 45(3), 1997, pp. 1115-1126
Citations number
50
Categorie Soggetti
Material Science","Metallurgy & Metallurigical Engineering
The local kinetics and topological phenomena during normal grain growt
h were studied in two dimensions by computer simulations employing a c
ontinuum diffuse-interface held model. The relationships between topol
ogical class and individual grain growth kinetics were examined, and c
ompared with results obtained previously from analytical theories, exp
erimental results and Monte Carlo simulations. It was shown that both
the grain-size and grain-shape (side) distributions are time-invariant
and the linear relationship between the mean radii of individual grai
ns and topological class n was reproduced. The moments of the shape di
stribution were determined, and the differences among the data from so
ap froth, Potts model and the present simulation were discussed. In th
e limit when the grain size goes to zero, the average number of grain
edges per grain is shown to be between 4 and 5, implying the direct va
nishing of 4- and 5-sided grains, which seems to be consistent with re
cent experimental observations on thin films. Based on the simulation
results, the conditions for the applicability of the familiar Mullins-
Von Neumann law and the Hillert's equation were discussed. Copyright (
C) 1997 Acta Metallurgica Inc.