The effects of device geometry, oxide thickness and bias condition on
the thermal noise of MOSFET's are investigated. The experimental resul
ts show that the conventional MOSFET thermal noise models do not accur
ately predict the thermal noise of MOSFET's. A model that is capable o
f predicting the thermal noise of both long and short channel devices
in both the triode and saturation regions is presented. This model, wh
ich can be easily implemented into existing simulators such as SPICE,
has been verified by a wide variety of measurements.