KINETIC PATTERN-FORMATION OF GD-SILICIDE FILMS IN LATERAL GROWTH GEOMETRY

The solid phase reaction of gadolinium thin film and silicon substrate was investigated in lateral growth geometry with the help of periodic titanium protective stripes by optical microscopy. In the lateral rea ction zone the shape of the interface between gadolinium and Gd silici de was very complicated and showed pattern formation. This silicide gr owth can be described as a kinetic process modified by the structure o f the Gd film in contrast to the previously proposed simple nucleation .