THE PROPERTIES OF P-DOPED A-SIH FILMS UNDER HIGH-TEMPERATURE ANNEALING

Citation
Yf. Zhang et al., THE PROPERTIES OF P-DOPED A-SIH FILMS UNDER HIGH-TEMPERATURE ANNEALING, Physica status solidi. a, Applied research, 143(2), 1994, pp. 110000103-110000105
Citations number
7
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
00318965
Volume
143
Issue
2
Year of publication
1994
Pages
110000103 - 110000105
Database
ISI
SICI code
0031-8965(1994)143:2<110000103:TPOPAF>2.0.ZU;2-7