Te. Sheridan et Mj. Alport, 2-DIMENSIONAL MODEL OF ION DYNAMICS DURING PLASMA SOURCE ION-IMPLANTATION, Applied physics letters, 64(14), 1994, pp. 1783-1785
Ion dynamics in the plasma sheath following the application of a negat
ive voltage pulse to a two-dimensional target are modeled using a time
-dependent, two-fluid simulation. The target considered is a square ba
r of infinite length. We find that the sheath focuses ions near to, bu
t not on, the comer of the bar, resulting in an enhancement of the dos
e received there.