2-DIMENSIONAL MODEL OF ION DYNAMICS DURING PLASMA SOURCE ION-IMPLANTATION

Authors
SHERIDAN TE ALPORT MJ
Citation
Te. Sheridan et Mj. Alport, 2-DIMENSIONAL MODEL OF ION DYNAMICS DURING PLASMA SOURCE ION-IMPLANTATION, Applied physics letters, 64(14), 1994, pp. 1783-1785
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
64
Issue
14
Year of publication
1994
Pages
1783 - 1785
Database
ISI
SICI code
0003-6951(1994)64:14<1783:2MOIDD>2.0.ZU;2-P
Abstract
Ion dynamics in the plasma sheath following the application of a negat ive voltage pulse to a two-dimensional target are modeled using a time -dependent, two-fluid simulation. The target considered is a square ba r of infinite length. We find that the sheath focuses ions near to, bu t not on, the comer of the bar, resulting in an enhancement of the dos e received there.