Ij. Fritz et al., ELECTRIC-FIELD-DEPENDENT ELECTROREFLECTANCE SPECTRA OF VISIBLE-BAND-GAP (INALGA)P QUANTUM-WELL STRUCTURES, Applied physics letters, 64(14), 1994, pp. 1824-1826
We present results from the first studies of electric-field effects on
optical transitions in visible-band-gap InGaP/InAlGaP multiple-quantu
m-well (MQW) structures. These structures, grown at 775-degrees-C by m
etalorganic vapor phase epitaxy on (100) GaAs substrates misoriented 6
-degrees towards [111]A, consist of nominally undoped MQWs surrounded
by doped In0.49Al0.51P cladding layers to form p-i-n diodes. The Stark
shifts of various allowed and forbidden quantum-well transitions were
observed in bias-dependent electroreflectance spectra of In0.49Ga0.51
P/In0.49(Al0.5Ga0.5)0.51P MQW samples with 10-nm-thick layers. We find
the magnitude of these shifts to depend on the details of the Mg dopi
ng profile, confirming the importance of Mg diffusion and unintentiona
l background doping in these materials. Our results show that (InAlGa)
P materials are promising for visible-wavelength electro-optic modulat
or applications.