Kt. Hsu et al., PHOTOREFLECTANCE CHARACTERIZATION OF AN INALAS INGAAS HETEROSTRUCTUREBIPOLAR-TRANSISTOR/, Applied physics letters, 64(15), 1994, pp. 1974-1976
We have measured the photoreflectance spectrum at 300 K from a lattice
-matched InAlAs/InGaAs heterostructure bipolar transistor grown by mol
ecular beam epitaxy. The energy features of photoreflectance spectra h
ave been identified and the built-in dc electric fields and associated
doping profiles have been evaluated in the n-InAlAs emitter from the
observed Franz-Keldysh oscillations. The undoped InGaAs spacer between
emitter and base was added on to change the built-in electric field.
The results showed that the energy features above the InGaAs band gap
are the transitions from the valence band to the quantized state of th
e conduction band. The quantum well of the conduction band is in the i
nterface of the InAlAs and InGaAs heterojunction. The interface charge
densities in the spacer channel are determined to be 3.54x10(11) cm-2
and 4.22x10(11) cm-2, corresponding to the samples with spacer thickn
esses of 300 and 500 angstrom, respectively. A triangular potential pr
ofile model was used to calculate the Microstructure in the potential
well and electron energy transition. The theoretical and experimental
results were compared and good agreements were also found.