Epitaxy of Ge on Si(001) from undersaturated solutions demonstrates a
novel principle: minimization of interfacial energy between solution a
nd solid in a system provides the driving force for heteroepitaxy. Gro
wth according to this principle leads to sharp heterointerfaces and Ge
layers free of nucleation sites for dislocations. The relations of in
terfacial and strain energy vary on the system's pathway towards self-
termination of growth and determine the layer morphology.