Wu. Schmidt et Rc. Alkire, USE OF ATOMIC-FORCE MICROSCOPY TO IMAGE SURFACES DURING FLUID-FLOW, Journal of the Electrochemical Society, 141(7), 1994, pp. 120000085-120000087
Use of atomic force microscopy (AFM) to image surfaces held under elec
trochemical control in the presence of fluid flow has been demonstrate
d. The performance of AFM during fluid flow was evaluated on (i) the a
tomic level (10 to 200 nm) using cleaved mica as the substrate, (ii) o
n the micron scale (1 to 12 mum) using a gold calibration ruling as th
e substrate, and (iii) on the micron scale during in situ electrodepos
ition of Cu onto Pt(100). The Reynolds numbers associated with the flu
id flow were evaluated by using the diameter and height of the cell as
cross-sectional area, and the hydraulic diameter based on the same ar
ea as characteristic length. Maximum Reynolds numbers of 8 for atomic
imaging (1 to 25 nm) and 130 for larger scales (1 to 12 mum) may be ma
intained without loss of imaging quality. The engagement force was the
significant parameter which influenced whether images could be obtain
ed during flow. The critical engagement force required for imaging var
ied linearly with flow rate.