ELECTRODEPOSITION OF COBALT-CHROMIUM ALLOY FROM TRIVALENT CHROMIUM SOLUTIONS

Citation
H. Dasarathy et al., ELECTRODEPOSITION OF COBALT-CHROMIUM ALLOY FROM TRIVALENT CHROMIUM SOLUTIONS, Journal of the Electrochemical Society, 141(7), 1994, pp. 1773-1779
Citations number
11
Categorie Soggetti
Electrochemistry
ISSN journal
00134651
Volume
141
Issue
7
Year of publication
1994
Pages
1773 - 1779
Database
ISI
SICI code
0013-4651(1994)141:7<1773:EOCAFT>2.0.ZU;2-6
Abstract
Cobalt-chromium alloy was deposited from plating solutions containing cobalt(II) chloride and chromium(III) chloride at 3.5 pH. The deposits were obtained using both single and mixed complex solutions. Deposit morphology showed significant dependence on the complexing agent(s), u sed. Partitioning of the two components in the deposit as determined b y energy dispersive spectroscopy depended on plating parameters such a s concentration ratio of the two salts in the solution, complexing age nt, type of current (both dc and pulsed current were studied), and cur rent density. X-ray photoelectron spectroscopy spectra collected from as-deposited alloy revealed the presence of both oxides and metals. X- ray diffraction spectra for the alloy deposit indicated solid solution formation.