NEW ASPECTS IN VOLMER-WEBER 3D GROWTH - AN XPS INTENSITY STUDY APPLIED TO THIN-FILMS OF AU AND CE ON POLYPROPYLENE

Citation
M. Heuberger et al., NEW ASPECTS IN VOLMER-WEBER 3D GROWTH - AN XPS INTENSITY STUDY APPLIED TO THIN-FILMS OF AU AND CE ON POLYPROPYLENE, Surface science, 314(1), 1994, pp. 13-22
Citations number
27
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
314
Issue
1
Year of publication
1994
Pages
13 - 22
Database
ISI
SICI code
0039-6028(1994)314:1<13:NAIV3G>2.0.ZU;2-0
Abstract
A new method of analyzing X-ray photoelectron spectroscopy or Auger el ectron spectroscopy intensity data is proposed, which allows an easy d istinction between the established growth modes (Frank-van der Merwe, Stranski-Krastanov, Volmer-Weber) of thin films. The method, applied t o thin films of Au or Ce on polypropylene (PP), reveals detailed infor mation about the growth mode. For Ce one observes Volmer-Weber growth at fixed substrate coverage, while for the less reactive gold, the fil m growth is island-like. The different chemical reactivity of the two metals towards PP is the probable cause for the film growth mode.