The defect responsible for the minority-carrier lifetime in P-type Czo
chralski silicon introduced by electron irradiation has been detected
and characterized by deep-level transient spectroscopy and spin-depend
ent recombination. From the isotropic g value (2.0055), the defect is
tentatively identified as a Si dangling bond originating from a vacanc
y cluster. Its energetic location in the gap is at 630 meV below the c
onduction band. The electron and hole cross sections and their variati
on with temperature have been determined, and found to account for the
minority-carrier lifetime of the material.