HEAT-TREATMENT EFFECTS ON POROUS SILICON

Citation
R. Sabetdariani et D. Haneman, HEAT-TREATMENT EFFECTS ON POROUS SILICON, Journal of applied physics, 76(2), 1994, pp. 1346-1348
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
76
Issue
2
Year of publication
1994
Pages
1346 - 1348
Database
ISI
SICI code
0021-8979(1994)76:2<1346:HEOPS>2.0.ZU;2-9
Abstract
High-resolution scanning electron microscoPy of porous silicon (PS) su bjected to various annealing treatments in vacuum has revealed a spher oidal particlelike structure that only become clearly apparent after t reatment at about 250-degrees-C. This is consistent with recent sugges tions that any quantum effects arise from particles. It is deduced tha t the particles have a coating that is reduced or removed on heating. The concomitant effects on the current-voltage curves of PS, caused by annealing and also by prolonged air exposure, have been measured, and are consistent with the interpretation.