ULTRATHIN ELECTROLYTIC NICKEL FILMS ON COPPER - THE FORMATION MECHANISM

Authors
TOCHITSKII TA FEDOSYUK VM BOLTUSHKIN AV DMITRIEVA AE
Citation
Ta. Tochitskii et al., ULTRATHIN ELECTROLYTIC NICKEL FILMS ON COPPER - THE FORMATION MECHANISM, Russian journal of electrochemistry, 30(2), 1994, pp. 178-181
Citations number
17
Categorie Soggetti
Electrochemistry
Journal title
Russian journal of electrochemistry → ACNP
ISSN journal
10231935
Volume
30
Issue
2
Year of publication
1994
Pages
178 - 181
Database
ISI
SICI code
1023-1935(1994)30:2<178:UENFOC>2.0.ZU;2-X
Abstract
Based on electron diffraction and electron microscopic data, a model i s proposed for the formation and growth of nickel and copper films les s than approximately 20 nm thick.