Atomic force microscopy data reveal self-affine scaling of plasma poly
mer films. The rms surface roughness sigma increases with film thickne
ss tau as sigma(f < xi-1) is similar to tau(beta), and with measuremen
t length L as sigma(f > L-1 > xi-1) is similar to L(alpha), where xi i
s the surface roughness correlation length. At the deposition rate R =
2 mum/h, the scaling exponents alpha and beta are 0.9 and 0.7, both i
ncreasing to 1 at R = 1 mum/h. A competition between surface relaxatio
n and deposition rate determine sigma and xi, which increase rapidly w
ith R or inverse temperature.