Metal-semiconducting diamond (MS) and metal-insulating diamond-semicon
ducting diamond (MIS) contacts were fabricated on the same type IIb si
ngle crystal diamond. Direct comparisons of MS and MIS structure chara
cteristics were made by analysis of current-voltage and differential c
apacitance-voltage (C-V) data. Both the MS and MIS contacts exhibited
good rectifying characteristics, with a 5 V rectification ratio > 10(6
). The depletion layer uncompensated acceptor concentration measured i
n both structures by C-V analysis was -1.8 X 10(16) cm-3.