LASER-INDUCED DEPOSITION OF ALUMINA FROM CONDENSED LAYERS OF ORGANOALUMINUM COMPOUNDS AND WATER

The photoassisted deposition of thin aluminum oxide films from layers of trimethylaluminum (TMA), dimethylaluminum hydride, and aluminum hex afluoroacetylacetonate condensed with water on a cold substrate has be en investigated. Laser energies of 4.6 or 2.3 eV were used to drive th e reactions which led to film growth. Experiments show that clean alum inum oxide films can be synthesized at 80 K by irradiating co-condense d TMA and H2O with 4.6 eV light. Techniques used to characterize the f ilms include Auger electron spectroscopy and scanning electron microsc opy.