ANODIC-OXIDATION PROCESSES OF COPPER WITH A MERCURY-ELECTRODE IN THE PRESENCE OF HYDROGEN-PEROXIDE AND IN UNBUFFERED SODIUM-CHLORIDE SOLUTIONS

The oxidation processes of copper with a mercury electrode were invest igated in the presence of H2O2 and in unbuffered NaCl solutions. The m ethod used was anodic stripping alternating current voltammetry. Owing to the electrocatalytic process of Cu and H2O2, the local pH around t he electrode increases, resulting in copper(I) oxide formation. It was determined that the anodic peak current relating to Cu2O deposition o n the electrode surface is directly proportional to H2O2 concentration . The product of the Cu2+ and H2O2 concentrations in solution at which the Cu2O deposit on the electrode surface first appears is constant. These results suggest the possibility of the determination of H2O2, or dissolved oxygen in similar systems. The possible structural changes and oxidation processes of the Cu2O film are discussed.