Ch. Lin et al., A LOW-VOLTAGE, HIGH-REFLECTANCE-CHANGE NORMALLY OFF REFRACTIVE GAAS AL0.2GA0.8AS MQW REFLECTION MODULATOR/, IEEE journal of quantum electronics, 30(5), 1994, pp. 1234-1240
We present our optimization of a normally off refractive GaAs/AlxGa1-x
As multiple-quantum-well (MQW) reflection modulator with respect to th
e ON/OFF reflectance change, ON/OFF contrast ratio, and operating volt
age. We use optical transfer matrices, theoretically calculated refrac
tive indices, and absorption coefficients to simulate the operation of
a normal-incident Fabry-Perot MQW modulator. Our calculations suggest
that a normally off refractive GaAs/Al0.2Ga0.8As MQW reflection modul
ator with a reflectance change of 42.9% and an ON/OFF contrast ratio o
f 1539 for an operating voltage of only 2.44 V can be fabricated by mo
lecular-beam epitaxy (MBE).