THE DEVELOPMENT OF TEXTURE IN CO-CR FILMS

Citation
Cz. Li et al., THE DEVELOPMENT OF TEXTURE IN CO-CR FILMS, IEEE transactions on magnetics, 30(4), 1994, pp. 1373-1379
Citations number
21
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189464
Volume
30
Issue
4
Year of publication
1994
Part
1
Pages
1373 - 1379
Database
ISI
SICI code
0018-9464(1994)30:4<1373:TDOTIC>2.0.ZU;2-P
Abstract
Texture development as a function of film thickness (5-980 nm) was inv estigated for two series of Co81Cr19 films. In general, the films were strongly textured. The orientation ratio, OR(c), was used to describe the strength of the texture. Experimental data showed that for the Se ries A films (5200 nm), the OR(c) value increased with increasing film thickness, while for Series B films (46-980 nm), the OR(c), as a func tion of the film thickness described a single peak curve, with its max imum near 130 nm. The calculated local orientation ratios OR(cx) for b oth the Series A and B films had maxima near 110 nm. The strain in Co- Cr films also changes with the film thickness. In the case of the Seri es B films, the strain along the film normal gradually changed from a tensile to a compressive strain with increasing film thickness, and ne ar 130 nm the film was in a stress-free condition. It was also discove red that for Co-Cr films thinner than 46 nm, the aspect ratio of the g rains approaches 1 and the typical columnar structure of grains is not observed, although (0002) fibre texture still exists.