The photoluminescence of single GaAs/GaAlAs heterostructures was studi
ed as a function of the heterojunction formation conditions: the epita
xy temperature, the donor concentration in GaAs, and the crystallizati
on driving force. In addition to bands of the bulk luminescence of GaA
s and GaAlAs, the photoluminescence spectra contain a band due to the
heterojunction (a band of interface luminescence). There is a threshol
d value of the heterojunction formation temperature for the existence
of this interface luminescence. Specifically, the interface luminescen
ce arises if the temperature is above T(cr)F, while it disappears belo
w this temperature. The threshold temperature T(cr)F decreases with de
creasing crystallization driving force during the formation of the het
erojunction. It depends on the structural quality of the narrow-gap re
gion (GaAs) of the heterostructure. The threshold for the onset and di
sappearance of the interface luminescence is explained on the basis of
two assumptions. First, it is assumed that the interface luminescence
is due to the annihilation of an interface exciton formed by a 2D ele
ctron at the heterojunction and a 3D hole. Second, it is assumed that
a change in the heterojunction formation mechanism upon a roughening p
hase transition at the substrate surface leads to an abrupt decrease i
n the number of inhomogeneities in the plane of the heterojunction. Th
e effect is to promote the formation of interface excitons.