SPECTRAL HOLE-BURNING ON SILICON PHTHALOCYANINES ISOLATED IN AN ARGONMATRIX

Citation
D. Braun et al., SPECTRAL HOLE-BURNING ON SILICON PHTHALOCYANINES ISOLATED IN AN ARGONMATRIX, Chemical physics letters, 225(4-6), 1994, pp. 398-403
Citations number
25
Categorie Soggetti
Physics, Atomic, Molecular & Chemical
Journal title
ISSN journal
00092614
Volume
225
Issue
4-6
Year of publication
1994
Pages
398 - 403
Database
ISI
SICI code
0009-2614(1994)225:4-6<398:SHOSPI>2.0.ZU;2-S
Abstract
Irradiation of the monomeric phthalocyanine HexSiO(SiPc)OSiHex3 isolat ed in an Ar matrix at T = 13 K with the 632.8 nm line of a He/Ne laser produces a resonant spectral hole in the vibrational sideband located about 700 cm-1 above the origin of the Q band. This hole is accompani ed by several sideholes in the origin region. These permit a precise d etermination of several excited-state vibrational frequencies. For dim eric Hex3SiO(SiPC-O-SiPc)OSiHex3 in the same matrix the changes in the absorption spectra after irradiation into the Q band reveal an out-of -plane polarization of the bands which are not present in the monomer absorption. This points to substantial charge-resonance contributions to the excitonic coupling between the two SiPc units in dimeric Hex3Si O(SiPc-O-SiPc)OSiHex3.