Sr. Roy et al., A NOVEL REACTOR DESIGN CONFIGURATION FOR CONTAMINATION CONTROL AND IMPROVED PERFORMANCE IN THE POLYSILICON DOPING PROCESS USING POCL3, Journal of the Electrochemical Society, 141(8), 1994, pp. 2257-2262
Conventional POCl3 reactors have process limitations because of the ha
zardous nature of process by-products. Experiments were conducted usin
g a novel design quartz flange and stainless steel clamp exhaust confi
guration, along with a scavenger insulation block, which eliminated pr
ocess by-product buildup inside the reactor tube in the scavenger area
. Experiments included variations in doping temperature, process time,
POCl3 flow rate, and carrier and exhaust gas flow rates. This novel(e
) hardware design practically eliminates by-product condensation and d
ripping outside the reactor, which reduces cross-contamination and sta
inless steel corrosion problems and prevents potential minority carrie
r lifetime degradation. Equipment downtime is significantly reduced by
eliminating autodoping and the need for frequent process tube steam c
leans. Run capability is extended because of the new design, which als
o provides superior exhaust control and safer operation. The design al
so allows doubling of the number of wafers processed with improved she
et resistance uniformity. Regression equations were obtained for calcu
lating sheet resistance, which can be a viable tool for process engine
ers. The new reactor configuration provides significant advantages in
reduced equipment downtime, increased savings in material, and improve
d process performance.