Fully processed VLSI GaAs MESFET circuits, available through the MOSIS
service, have recently been shown to be electrically stable after 3-h
thermal cycles at 500-degrees-C. It is therefore feasible to epitaxia
lly regrow photonic device heterostructures directly on high-density e
lectronic circuits yielding monolithic optoelectronic VLSI circuits. T
he MBE growth, planarization, and LED fabrication of the first optoele
ctronic circuit using this novel integration technique are described.