Mf. Butman et al., THERMAL ION EMISSION FROM POTASSIUM FLUORIDE DEPOSITED ON A SUBSTRATE-METAL SURFACE, Applied surface science, 78(4), 1994, pp. 421-435
Citations number
41
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Thermal emission rates of K+ and F- ions from thick potassium fluoride
layers on a metal substrate were measured alternately as a function o
f the sample temperature (670-990 K) or the extracting voltage (0-500
V) in ultra-high vacuum (approximately 3 x 10(-9) Torr). In the course
of an induction period, a gradual decrease of isothermal ion currents
with time and ion accumulation at the sample surface during applicati
on of the retarding electrical field against either ions were observed
prior to attaining a steady-state ion emission. The results thus obta
ined were discussed in light of (1) the terrace-ledge-kink model of va
porization, (2) the morphological development on alkali halide surface
and (3) the concept of surface charge in ionic crystals. The activati
on energies for the desorption of K+ and F- ions, changing from about
2.6 to 2.2 eV and from 2.2 to 2.8 eV, respectively, with increasing te
mperature, were derived from the respective slopes of Arrhenius plots.
The ion emission rates were analyzed on the basis of a theoretically
deduced equation of ion emission, thereby elucidating the influence of
the surface electrical potential and the relative importance of surfa
ce kinks to the ion emission. The non-stoichiometry in kink-site occup
ancy by cations and anions, favoring the emission of K+, was demonstra
ted to be of defect-related origin.