THERMAL ION EMISSION FROM POTASSIUM FLUORIDE DEPOSITED ON A SUBSTRATE-METAL SURFACE

Citation
Mf. Butman et al., THERMAL ION EMISSION FROM POTASSIUM FLUORIDE DEPOSITED ON A SUBSTRATE-METAL SURFACE, Applied surface science, 78(4), 1994, pp. 421-435
Citations number
41
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
78
Issue
4
Year of publication
1994
Pages
421 - 435
Database
ISI
SICI code
0169-4332(1994)78:4<421:TIEFPF>2.0.ZU;2-V
Abstract
Thermal emission rates of K+ and F- ions from thick potassium fluoride layers on a metal substrate were measured alternately as a function o f the sample temperature (670-990 K) or the extracting voltage (0-500 V) in ultra-high vacuum (approximately 3 x 10(-9) Torr). In the course of an induction period, a gradual decrease of isothermal ion currents with time and ion accumulation at the sample surface during applicati on of the retarding electrical field against either ions were observed prior to attaining a steady-state ion emission. The results thus obta ined were discussed in light of (1) the terrace-ledge-kink model of va porization, (2) the morphological development on alkali halide surface and (3) the concept of surface charge in ionic crystals. The activati on energies for the desorption of K+ and F- ions, changing from about 2.6 to 2.2 eV and from 2.2 to 2.8 eV, respectively, with increasing te mperature, were derived from the respective slopes of Arrhenius plots. The ion emission rates were analyzed on the basis of a theoretically deduced equation of ion emission, thereby elucidating the influence of the surface electrical potential and the relative importance of surfa ce kinks to the ion emission. The non-stoichiometry in kink-site occup ancy by cations and anions, favoring the emission of K+, was demonstra ted to be of defect-related origin.