ADHESION STUDIES OF SPUTTERED ALUMINUM FILMS ON XC-70 STEEL SUBSTRATES - EFFECTS OF THE APPLICATION OF A BIAS VOLTAGE ON THE SUBSTRATE DURING DEPOSITION

Citation
A. Lahmar et M. Cailler, ADHESION STUDIES OF SPUTTERED ALUMINUM FILMS ON XC-70 STEEL SUBSTRATES - EFFECTS OF THE APPLICATION OF A BIAS VOLTAGE ON THE SUBSTRATE DURING DEPOSITION, Thin solid films, 248(2), 1994, pp. 204-211
Citations number
41
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
248
Issue
2
Year of publication
1994
Pages
204 - 211
Database
ISI
SICI code
0040-6090(1994)248:2<204:ASOSAF>2.0.ZU;2-6
Abstract
The adhesion strength of sputtered aluminium films to XC 70 steel subs trates has been studied using the scratch adhesion test. The influence of the application of a bias voltage on the substrate during depositi on was investigated by means of a mean critical load derived from a We ibull-like statistical analysis. It was found that in the absence of b ias, the interface is rather abrupt, while the interface obtained with the application of a bias voltage is much more diffuse. We can consid er that the widening of the interfacial region offers a better film an chorage on its substrate, requiring a stylus load value clearly excess ively high to produce an adhesion failure.