The adsorption and thermal decomposition of ethylsilane was studied on
the Si(100) 2 x 1 reconstructed surface using high resolution electro
n energy loss spectroscopy and temperature programmed desorption mass
spectrometry. Ethylsilane dissociatively absorbed on the surface at a
saturation coverage of approximately 0.25 monolayers Thermal decomposi
tion of ethylsilane proceeded by beta-hydride elimination, resulting i
n the desorption of ethylene at 700 K. Hydrogen adsorbed on the substr
ate as the 2 x 1 monohydride and desorbed at approximately 800 K, leav
ing behind a carbon-free surface.