The strain and crystalline perfection of GaAs implanted with either ca
rbon, gallium, or both carbon and gallium ions (5 X 10(14) cm-2) were
investigated using high-resolution triple axis diffractometry. We dete
rmined that a significant amount of carbon occupied substitutional sit
es after rapid thermal annealing only when gallium was co-implanted. T
he carbon in the carbon-implanted layer remained in nonsubstitutional
sites after annealing. In both cases, most of the lattice strain in th
e implanted layer decreases upon annealing, but a defective crystallin
e structure with an extensive mosaic spread evolves. Conventional doub
le-axis x-ray measurements were employed for comparison.