STRUCTURE AND MAGNETIC-PROPERTIES OF CO CU MULTILAYER FILMS/

The structure, magnetic properties and magnetoresistance of Co/Cu mult ilayer films grown by sputtering on Si (100) wafers, with Co layer thi cknesses between 1.9 nm and 2.0 nm and Cu layer thicknesses between 0. 5 nm and 1.3 nm, have been studied. X-ray diffraction, transmission el ectron microscopy, and optical diffractogram analysis show layered str uctures and a columnar face-centred-cubic (111) crystallographic textu re extending through several layers in the films. The magnetic domain structure was studied by Lorentz microscopy, and the domain structure and image contrast were found to depend strongly on the Cu layer thick ness and magnetoresistance. Hysteresis curves explain the trends of ma gnetic domain contrast and magnetic coupling in the films. Annealed sa mples show a more regular domain structure, and lower saturating field and magnetoresistance than as-sputtered samples.