Zl. Chen et al., ELECTRICAL CHARACTERIZATION AND MODELING OF WIDE-BAND-GAP POROUS SILICON P-N DIODES, Journal of applied physics, 76(4), 1994, pp. 2499-2504
The current through porous silicon p-n junctions is measured as a func
tion of bias voltage and temperature. The ideality factor m = 4 value
observed under forward bias indicates that channels are present at the
unpassivated porous silicon junction surfaces. The generation-recombi
nation current stemming from the space-charge regions between the surf
ace channels and the bulk silicon regions dominates the measured diode
current. From the thermal activation energy of the diode saturation c
urrent a value of 2.2 eV is calculated for the band gap of porous sili
con, which is in good agreement with the value of 2.0 eV found from th
e photo- and electroluminescence spectra emitted by these diodes.