ELECTRICAL CHARACTERIZATION AND MODELING OF WIDE-BAND-GAP POROUS SILICON P-N DIODES

Citation
Zl. Chen et al., ELECTRICAL CHARACTERIZATION AND MODELING OF WIDE-BAND-GAP POROUS SILICON P-N DIODES, Journal of applied physics, 76(4), 1994, pp. 2499-2504
Citations number
30
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
76
Issue
4
Year of publication
1994
Pages
2499 - 2504
Database
ISI
SICI code
0021-8979(1994)76:4<2499:ECAMOW>2.0.ZU;2-M
Abstract
The current through porous silicon p-n junctions is measured as a func tion of bias voltage and temperature. The ideality factor m = 4 value observed under forward bias indicates that channels are present at the unpassivated porous silicon junction surfaces. The generation-recombi nation current stemming from the space-charge regions between the surf ace channels and the bulk silicon regions dominates the measured diode current. From the thermal activation energy of the diode saturation c urrent a value of 2.2 eV is calculated for the band gap of porous sili con, which is in good agreement with the value of 2.0 eV found from th e photo- and electroluminescence spectra emitted by these diodes.