TaN films have many attractive characteristics, and so have been used
for electronic and mechanical applications. There are many methods use
d for deposition of TaN films. Recently, the ion-beam dynamic mixing m
ethod has been used for thin film deposition and materials modificatio
n. In order to obtain high performance, stoichiometric composition and
good adhesion we have deposited TaN films by a dual-ion-beam dynamic
mixing method. This paper introduces the deposition and properties of
TaN films on M50 steel by dual-ion-beam dynamic mixing. The microstruc
ture of films was analysed by X-ray diffraction and Auger electron spe
ctroscopy (AES). The microhardness, resistance to wear and erosion of
these films were determined. The results showed that (1) the TaN films
were successfully deposited on M50 steel by this method, (2) the perf
ormance, resistance to wear and erosion of M50 steel were improved by
ion-beam-mixing deposition of the TaN thin films, (3) AES showed there
was a mixed layer on the film interface, (4) the microhardness of the
thin film depends on microstructure and thickness and (5) the microst
ructure and quality of the films depends on the deposition conditions,
so it is important to select the proper operational parameters of ion
sources.