ZRO2 AND CU FUNCTIONALLY GRADIENT MATERIALS PREPARED BY A DYNAMIC IONMIXING PROCESS

ZrO2-Cu films have been prepared as functionally gradient materials (F GM) which change continuously from Cu to ZrO2. Partially stabilized Zr O2 (PSZ) and the PSZ-Cu FGM films were prepared on a Cu substrate by a dynamic ion mixing process. Oxygen ion irradiation was essential for the FGM formation of the PSZ-Cu films, because films deposited without oxygen ion irradiation were easily peeled from the substrate during t he deposition steps. The electron beam deposition rates of Cu and ZrO2 were individually controlled. The FGM structures were analysed by X-r ay photoelectron spectroscopy and transmission electron microscopy. Cu and PSZ crystal grains were finely mixed in the FGM layers. The therm al resistance of the FGMs was examined by a heat test in which the fil m surface was heated by an Ar + H-2 plasma jet. No cracks were observe d on the PSZ-Cu FGM surfaces after the test. However, for PSZ film (wi thout the FGM layer) on the Cu substrate, cracks were seen.