PATTERNING OF SELF-ASSEMBLED ALKANETHIOL MONOLAYERS ON SILVER BY MICROFOCUS ION AND ELECTRON-BEAM BOMBARDMENT

Decanethiol [CH3(CH2)9SH] self-assembled monolayer films on silver sub strates have been irradiated in selected areas by focused ion or elect ron bombardment. Subsequent immersion of the irradiated sample in a so lution of a fluoromercaptan [CF3(CF2)2(CH2)2SH] results in attachment of this molecule to the silver surface in the ion or electron-exposed regions, producing a micrometer spatial-scale pattern of two chemicall y distinct alkanethiol monolayers. The coverage Of the fluoromercaptan on the bombarded areas was found to reach maximum levels of 70% at io n doses of 6 x 10(13) ionS/CM2 and 50% at electron doses of 2 X 10(17) electrons/cm2 as determined by secondary ion mass spectrometry. These methods of maskless patterning may be useful for semiconductor or bio sensor device fabrication.