STRAINED INAS INP QUANTUM-WELL HETEROSTRUCTURE LASERS GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION/

Citation
Qj. Xing et al., STRAINED INAS INP QUANTUM-WELL HETEROSTRUCTURE LASERS GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION/, Applied physics letters, 65(5), 1994, pp. 567-569
Citations number
18
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
65
Issue
5
Year of publication
1994
Pages
567 - 569
Database
ISI
SICI code
0003-6951(1994)65:5<567:SIIQHL>2.0.ZU;2-I
Abstract
This letter reports the successful operation at room temperature of a separate confinement heterostructure InAs/InGaAs/InP strained-layer mu ltiple quantum well laser grown by low-pressure metalorganic chemical vapor deposition. The threshold current density was as low as 250 A/cm 2 for a 600X200 mum broad area laser device. The characteristic temper ature T0 was found to be 190 K between 100 and 130 K, and 147 K betwee n 130 and 300 K. The lasing wavelength was 1.7 mum at room temperature .