The radio frequency muSR technique developed at TRIUMF was used to mea
sure the temperature dependence of the diamagnetic muon, Mu, and Mu a
mplitudes in silicon between 10 K and 500 K. Six samples doped with ph
osphorus (n-type) and boron (p-type) in the concentration range 10(11)
to 10(15) cm-3 were studied. In pure Si a very good fit over the whol
e temperature range is obtained from a model that includes the ionizat
ion of Mu a,nd Mu to a bond centered mu+ followed at high temperature
by charge exchange involving Mu.