Studies of the muonium fractions in the amorphous oxide a-SiO have bee
n carried out by RF resonance at TRIUMF, Canada and LF repolarization
techniques at RAL, U.K. The resonance measurements confirm the presenc
e of the interstitial Mu centre in this intermediate oxide of silicon.
Analysis of the data gathered at RAL, using a recently-developed fitt
ing technique, reveals that the Mu state is present here as well, but
with lower relative fractions than in a-Si. However, as in the latter
material, but in contrast to c-Si, this bond-centre species appears t
o be stable up to room temperature.