K. Yanagihara et al., THE ROLE OF MICROSTRUCTURE ON PESTING DURING OXIDATION OF MOSI2 AND MO(SI,AL)(2) AT 773 K, Oxidation of metals, 47(3-4), 1997, pp. 277-293
The pesting behavior of MoSi2 and Mo(Si,Al)(2) has been examined in ai
r at 773 K to clarify the origin and mechanism of pesting phenomena an
d the effect of aluminum on pesting phenomena. The initial cracks play
a much more important role than the grain boundaries and the initial
oxide layer in pesting. Mo and Si oxidize to amorphous Mo-Si-O simulta
neously with about a 200% volume expansion. Therefore, large stress ap
pears at the cracktips and induce many new cracks. MoO3 vaporizes from
the Mo-Si-O layer on the external surface and crack surfaces causing
the oxides in the initial cracks to become porous. Oxygen has a short-
circuit path to enter the sample in the cracks. Therefore, the partial
pressure of oxygen is sufficiently high to allow oxidation of Mo ill
the materials. The platelet-like MoO3 grows on the external surface an
d also in the cracks. Finally, the sample distintegrates into powder.
Pesting of Mo(Si,Al)(2) occurs in the same way, however, its rate is m
uch lower than that of MoSi2. The role of Al is to decrease the initia
l crack density of the samples from the melt. Other effects of Al migh
t be to decrease the oxygen flux toward the oxide-intermetallic interf
ace and to increase the plasticity of the amorphous oxide being formed
in the cracks.