CHEMICAL-VAPOR-DEPOSITION OF COPPER FOR IC METALLIZATION - PRECURSOR CHEMISTRY AND MOLECULAR-STRUCTURE

Authors
DOPPELT P BAUM TH
Citation
P. Doppelt et Th. Baum, CHEMICAL-VAPOR-DEPOSITION OF COPPER FOR IC METALLIZATION - PRECURSOR CHEMISTRY AND MOLECULAR-STRUCTURE, MRS bulletin, 19(8), 1994, pp. 41-48
Citations number
109
Categorie Soggetti
Material Science","Physics, Applied
Journal title
MRS bulletin → ACNP
ISSN journal
08837694
Volume
19
Issue
8
Year of publication
1994
Pages
41 - 48
Database
ISI
SICI code
0883-7694(1994)19:8<41:COCFIM>2.0.ZU;2-J