AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF POLY(METHYL METHACRYLATE) SURFACE-MODIFIED BY 193 NM LASER-RADIATION/

Authors
VANSAARLOOS PP VERNON CF CHIRILA TV KLAUBER C
Citation
Pp. Vansaarloos et al., AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF POLY(METHYL METHACRYLATE) SURFACE-MODIFIED BY 193 NM LASER-RADIATION/, Polymer bulletin, 33(3), 1994, pp. 331-338
Citations number
21
Categorie Soggetti
Polymer Sciences
Journal title
Polymer bulletin → ACNP
ISSN journal
01700839
Volume
33
Issue
3
Year of publication
1994
Pages
331 - 338
Database
ISI
SICI code
0170-0839(1994)33:3<331:AXPSOP>2.0.ZU;2-5
Abstract
The chemistry of poly(methyl methacrylate) subjected to 193-nm radiati on, emitted by an argon-fluorine excimer laser, was studied by X-ray p hotoelectron spectroscopy. From the O/C atomic ratios measured at two different sampling depths, it is concluded that the role of depolymeri zation in the laser ablation process may be less important than previo usly suggested.