High-speed long-wavelength metal-semiconductor-metal (MSM) photodetect
ors were fabricated on the Fe-doped InP/GaAs material system on Si. Th
e detector layers were grown by MOCVD on exactly oriented Si(001) patt
erned with submicrometre pitch V-grooves. The devices show a fast impu
lse response (44ps FWHM, 83 ps fall time) and a large bandwidth of 3.4
GHz for illumination with 1.3mum light pulses at 5V bias.