NOVEL FUNCTIONAL POLYMERS FROM N-(TOSYLOXY)MALEIMIDE - PHOTOCHEMICAL ACID GENERATION IN SOLID-STATE AND APPLICATION AS RESIST MATERIALS

N-(Tosyloxy)maleimide (TsOMI) has been synthesized and used to make a novel functional maleimide polymer, and the photochemical and thermal properties of its styrenic copolymers were investigated. The N-(tosylo xy)maleimide unit in the alternating copolymers was designed for photo chemical acid generation and the copolymers generated p-toluenesulfoni c acid by deep-UV irradiation over 30 mol % based on the TsOMI content . The photochemical acid generation was much enhanced when hydroquinon e was added. A t-BOC-protected copolymer, sOMI-alt-p-(((tert-butyloxy) carbonyl)oxy)styrene], showed the capability of a single-component res ist system in the deep-UV region based on the chemical amplification c oncept. The single-component resist rendered negative- and positive-to ne images by developing with suitable solvents.