ANALYSIS OF PPMMA FILMS FROM OXYGEN PLASMA USING X-RAY PHOTOELECTRON-SPECTROSCOPY

Authors
KURUVILLA BA ZAMBRE M GOSAVI S GORWADKAR S DATTA A GANGAL SA KULKARNI SK
Citation
Ba. Kuruvilla et al., ANALYSIS OF PPMMA FILMS FROM OXYGEN PLASMA USING X-RAY PHOTOELECTRON-SPECTROSCOPY, Journal of polymer science. Part A, Polymer chemistry, 32(12), 1994, pp. 2275-2281
Citations number
13
Categorie Soggetti
Polymer Sciences
Journal title
Journal of polymer science. Part A, Polymer chemistry → ACNP
ISSN journal
0887624X
Volume
32
Issue
12
Year of publication
1994
Pages
2275 - 2281
Database
ISI
SICI code
0887-624X(1994)32:12<2275:AOPFFO>2.0.ZU;2-C
Abstract
Plasma polymerized methyl methacrylate (PPMMA) films have been synthes ised on silicon substrates in RF glow discharge using oxygen plasma. T he electron beam delineation sensitivity of the PPMMA films has been s tudied systematically by varying oxygen and monomer flow rates. X-ray photoelectron spectroscopy (XPS) analysis clearly illustrates how C/O ratio in the films determines the properties of PPMMA films as electro n beam resist. (C) 1994 John Wiley & Sons, Inc.