Ba. Kuruvilla et al., ANALYSIS OF PPMMA FILMS FROM OXYGEN PLASMA USING X-RAY PHOTOELECTRON-SPECTROSCOPY, Journal of polymer science. Part A, Polymer chemistry, 32(12), 1994, pp. 2275-2281
Plasma polymerized methyl methacrylate (PPMMA) films have been synthes
ised on silicon substrates in RF glow discharge using oxygen plasma. T
he electron beam delineation sensitivity of the PPMMA films has been s
tudied systematically by varying oxygen and monomer flow rates. X-ray
photoelectron spectroscopy (XPS) analysis clearly illustrates how C/O
ratio in the films determines the properties of PPMMA films as electro
n beam resist. (C) 1994 John Wiley & Sons, Inc.