ION-ASSISTED DEPOSITION WITH AN ADVANCED PLASMA SOURCE

Thermal evaporation is commonly used for the production of optical coa tings. The low packing density of thermally evaporated films implies o ptical constants and mechanical properties which are inferior to those of the bulk materials. For the investigations of the plasma IAD proce ss we used a newly developed advanced plasma source (APS) with special features. The properties of dielectric layers deposited with plasma-I AD will be presented in comparison to conventional thermally evaporate d films. In particular, the results of scratch resistant layers in com bination with antireflection coatings on organic substrates will be sh own.