WEAR RESIDUE FROM POLISHING SAPPHIRE WITH SILICA AQUASOL ON A TIN LAP

Authors
Citation
J. Werner et O. Weis, WEAR RESIDUE FROM POLISHING SAPPHIRE WITH SILICA AQUASOL ON A TIN LAP, Wear, 176(2), 1994, pp. 239-245
Citations number
25
Categorie Soggetti
Material Science","Engineering, Mechanical
Journal title
WearACNP
ISSN journal
00431648
Volume
176
Issue
2
Year of publication
1994
Pages
239 - 245
Database
ISI
SICI code
0043-1648(1994)176:2<239:WRFPSW>2.0.ZU;2-T
Abstract
Sapphire can be superpolished with a tin lap and aqueous colloidal sil ica as a polishing liquid. We present investigations of the polishing residue that was enriched in a special wearing mill. Elemental analysi s, X-ray analysis by diffraction and MAS-NMR studies were performed to obtain an understanding of the microscopic polishing mechanism. We co nclude that sapphire is abraded atom by atom in this polishing procedu re and that the abraded aluminum atoms are finally chemically bonded i n the colloidal silica clusters, in contrast to models proposed earlie r.